Optimized Activation of Solution-Processed Amorphous Oxide Semiconductors for Flexible Transparent Conductive Electrodes

Abstract

Here, the preparation of transparent amorphous oxide semiconductor (AOS) films with unprecedented conductivity via an optimized activation process under hydrogen atmosphere for applications in solution-processed large-area optoelectronics is reported. Owing to their high cost and mechanical vulnerability, conventional vacuum-processed indium-tin oxide (ITO) electrodes are inappropriate for use in next-generation flexible and wearable electronic devices and systems. As an alternative to the ITO electrodes, solution-processed AOS films, such as alpha-IZO and alpha-ZITO, with an optimized composition and postreduction treatment under hydrogen show the highest electrical conductivity of approximate to 300 S cm(-1) and a high optical transmittance of over 90% at 550 nm. The microstructures and electrical properties of these AOS films are also studied in order to determine the optimized chemical composition and postreduction conditions. It is found that a controlled hydrogen reduction treatment of AOS films is critical for achieving high electrical conductivity by suppressing the surface morphology degradation and grain boundary disconnection. Furthermore, the alpha-IZO transparent conductive electrodes are successfully implemented for high efficiency organic photovoltaic cells based on the PTB7/PC71BM active layers. This technique promises the low-cost fabrication of high mobility and/or conductive AOSs for their applications in large-area transparent and flexible optoelectronics.

Description

B.D.C., J.P., and K.-J.B. contributed equally to this work. This work was supported in part by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (Nos. NRF-2016K2A9A1A06924256 and NRF-2017R1C1B2005254) and the Technology Innovation Program (No. 10065651) funded by MOTIE/KEIT.

Keywords

transparent conductive electrodes, oxide solution-processing, indium-zinc oxide, amorphous oxide semiconductors, activation treatments

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Volume: 4

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1

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