N-Type Conductivity in Si-Doped Amorphous Aln: An Ab Initio Investigation

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Date

2016

Journal Title

Journal ISSN

Volume Title

Publisher

Taylor & Francis Ltd

Open Access Color

Green Open Access

Yes

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8

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3

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No
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Abstract

We report the electronic structure and topology of a heavily Si-doped amorphous aluminium nitride (Al37.5Si12.5N50) using ab initio simulations. The amorphous Al37.5Si12.5N50 system is found to be structurally similar to pure amorphous aluminium nitride. It has an average coordination number of about 3.9 and exhibits a small amount of Si-Si homopolar bonds. The formation of Si-Al bonds is not very favourable. Electronic structure calculations reveal that the Si doping has a negligible effect on the band gap width but causes delocalization of the valence band tail states and a shift of the Fermi level towards the conduction band. Thus, amorphous Al37.5Si12.5N50 alloys show n-type conductivity.

Description

Durandurdu, Murat/0000-0001-5636-3183;

Keywords

Density-Functional Method, Amorphous Semiconductors, Aluminium Alloys, Electrical Conductivity, Ab Initio Method, Molecular Dynamic Simulations

Fields of Science

02 engineering and technology, 0210 nano-technology

Citation

WoS Q

Q3

Scopus Q

Q3
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N/A

Source

Philosophical Magazine

Volume

96

Issue

11

Start Page

1110

End Page

1121
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Scopus : 0

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