N-Type Conductivity in Si-Doped Amorphous Aln: An Ab Initio Investigation
N-Type Conductivity in Si-Doped Amorphous Aln: An Ab Initio Investigation
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Özet
We report the electronic structure and topology of a heavily Si-doped amorphous aluminium nitride (Al37.5Si12.5N50) using ab initio simulations. The amorphous Al37.5Si12.5N50 system is found to be structurally similar to pure amorphous aluminium nitride. It has an average coordination number of about 3.9 and exhibits a small amount of Si-Si homopolar bonds. The formation of Si-Al bonds is not very favourable. Electronic structure calculations reveal that the Si doping has a negligible effect on the band gap width but causes delocalization of the valence band tail states and a shift of the Fermi level towards the conduction band. Thus, amorphous Al37.5Si12.5N50 alloys show n-type conductivity.
Açıklama
Durandurdu, Murat/0000-0001-5636-3183;
ORCID
Anahtar kelimeler
Density-Functional Method, Amorphous Semiconductors, Aluminium Alloys, Electrical Conductivity, Ab Initio Method, Molecular Dynamic Simulations, Densityfunctional Method
Bilim Dalları
02 engineering and technology, 0210 nano-technology
Alıntı
WoS Q
Scopus Q
Kaynak
Cilt
96
Sayı
11
Başlangıç Sayfası
1110
Bitiş Sayfası
1121
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