N-Type Conductivity in Si-Doped Amorphous Aln: An Ab Initio Investigation

Loading...

Journal Title

Journal ISSN

Volume Title

Open Access Color

Green Open Access

Yes

OpenAIRE Downloads

8

OpenAIRE Views

3

Publicly Funded

No
Impulse
Average
Influence
Average
Popularity
Average

relationships.isProjectOf

relationships.isJournalIssueOf

Abstract

We report the electronic structure and topology of a heavily Si-doped amorphous aluminium nitride (Al37.5Si12.5N50) using ab initio simulations. The amorphous Al37.5Si12.5N50 system is found to be structurally similar to pure amorphous aluminium nitride. It has an average coordination number of about 3.9 and exhibits a small amount of Si-Si homopolar bonds. The formation of Si-Al bonds is not very favourable. Electronic structure calculations reveal that the Si doping has a negligible effect on the band gap width but causes delocalization of the valence band tail states and a shift of the Fermi level towards the conduction band. Thus, amorphous Al37.5Si12.5N50 alloys show n-type conductivity.

Description

Durandurdu, Murat/0000-0001-5636-3183;

Keywords

Density-Functional Method, Amorphous Semiconductors, Aluminium Alloys, Electrical Conductivity, Ab Initio Method, Molecular Dynamic Simulations, Densityfunctional Method

Fields of Science

02 engineering and technology, 0210 nano-technology

Citation

WoS Q

Scopus Q

OpenCitations Logo
OpenCitations Citation Count
N/A

Volume

96

Issue

11

Start Page

1110

End Page

1121
PlumX Metrics
Citations

Scopus : 0

Captures

Mendeley Readers : 5

Google Scholar Logo
Google Scholar™
OpenAlex Logo
OpenAlex FWCI
0.00

Sustainable Development Goals