N-Type Conductivity in Si-Doped Amorphous Aln: An Ab Initio Investigation
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Date
2016
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
Taylor & Francis Ltd
Open Access Color
Green Open Access
Yes
OpenAIRE Downloads
8
OpenAIRE Views
3
Publicly Funded
No
Abstract
We report the electronic structure and topology of a heavily Si-doped amorphous aluminium nitride (Al37.5Si12.5N50) using ab initio simulations. The amorphous Al37.5Si12.5N50 system is found to be structurally similar to pure amorphous aluminium nitride. It has an average coordination number of about 3.9 and exhibits a small amount of Si-Si homopolar bonds. The formation of Si-Al bonds is not very favourable. Electronic structure calculations reveal that the Si doping has a negligible effect on the band gap width but causes delocalization of the valence band tail states and a shift of the Fermi level towards the conduction band. Thus, amorphous Al37.5Si12.5N50 alloys show n-type conductivity.
Description
Durandurdu, Murat/0000-0001-5636-3183;
ORCID
Keywords
Density-Functional Method, Amorphous Semiconductors, Aluminium Alloys, Electrical Conductivity, Ab Initio Method, Molecular Dynamic Simulations
Fields of Science
02 engineering and technology, 0210 nano-technology
Citation
WoS Q
Q3
Scopus Q
Q3

OpenCitations Citation Count
N/A
Source
Philosophical Magazine
Volume
96
Issue
11
Start Page
1110
End Page
1121
PlumX Metrics
Citations
Scopus : 0
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Mendeley Readers : 5


